This course was given on 12 November 2018 at Hanyang University in Seoul, Korea. It was organized through The Korean Society of Semiconductor & Display Technology (KSDT) by prof. Hyeongtag Jeon. The speakers were prof. Gregory Parsons and prof. Erwin Kessels. The number of attendants was well over 100.

The course covered ALD basics (especially the underlying surface chemistry) as well as advanced ALD processes (including plasma-enhanced ALD and spatial ALD). The ALD processes addressed weremainly be related to applications relevant for the semiconductor and display industry.

Furthermore, recent developments in the field of atomic scale processing were discussed. This includes area-selective deposition (ASD) and atomic layer etching (ALE).

See also impressions of the course here.

The original announcement can be downloaded here (PDF).

Course material can be downloaded here (password protected).

Responses to the course:

(4.5/5) The course was well presented by the speakers
(4.3/5) The course met my expectations
(4.3/5) The course provided useful skills
(4.3/5) The course was well setup
(4.3/5)I would recommend the course to others

 

Schedule:

09:00-09:10	Greeting	Prof. Park (KSDT)
09:10-09:20	Introduction ALD Academy	Parsons, Kessels
09:10-10:00	Lecture preview	Parsons, Kessels
10:00-10:50	ALD basics I Surface chemistry	Kessels
10:50-11:10	Morning break
11:10-12:00	ALD basics II Precursors	Parsons
12:00-13:30	Lunch break
13:30-14:20	Advanced ALD processes I Plasma ALD	Kessels
14:20-15:10	Advanced ALD processes II Spatial ALD	Parsons
15:10-15:30	Afternoon break
15:30-16:20	Atomic scale processing I Atomic layer etching	Kessels
16:20-17:10	Atomic scale processing II Area-selective deposition	Parsons
17:10-17:30	Wrap up & closing	Parsons, Kessels

For additional information, please contact:

Prof. Hyeongtag Jeon

Division of Materials Science and Engineering

Hanyang University

Email address: hjeon@hanyang.ac.kr