ALD course / Hanyang University Seoul Korea

This course will be given on 12 November 2018 at Hanyang University in Seoul, Korea. The speakers will be prof. Gregory Parsons and prof. Erwin Kessels.

The course will cover ALD basics (especially the underlying surface chemistry) as well as advanced ALD processes (including plasma-enhanced ALD and spatial ALD). The ALD processes addressed will mainly be related to applications relevant for the semiconductor and display industry.

Furthermore, recent developments in the field of atomic scale processing will be discussed. This includes area-selective deposition (ASD) and atomic layer etching (ALE).

Preliminary schedule:

09:00-09:10 Introduction ALD Academy
09:10-10:00 Lecture preview
10:00-10:50 ALD basics I
10:50-11:10 Morning break
11:10-12:00 ALD basics II
12:00-13:30 Lunch break
13:30-14:20 Advanced ALD processes I
14:20-15:10 Advanced ALD processes II
15:10-15:30 Afternoon break
15:30-16:20 Atomic scale processing I
16:20-17:10 Atomic scale processing II
17:10-17:30 Wrap up & closing

For additional information, please contact:

Prof. Hyeongtag Jeon

Division of Materials Science and Engineering

Hanyang University

Email address: