This course was given on 12 November 2018 at Hanyang University in Seoul, Korea. It was organized through The Korean Society of Semiconductor & Display Technology (KSDT) by prof. Hyeongtag Jeon. The speakers were prof. Gregory Parsons and prof. Erwin Kessels. The number of attendants was well over 100.
The course covered ALD basics (especially the underlying surface chemistry) as well as advanced ALD processes (including plasma-enhanced ALD and spatial ALD). The ALD processes addressed weremainly be related to applications relevant for the semiconductor and display industry.
Furthermore, recent developments in the field of atomic scale processing were discussed. This includes area-selective deposition (ASD) and atomic layer etching (ALE).
See also impressions of the course here.
The original announcement can be downloaded here (PDF).
Course material can be downloaded here (password protected).
Responses to the course:
32 34.8% 29 31.5% 27 29.3% 4 4.3%
The course was well presented by the speakers
The course met my expectations
The course provided useful skills
The course was well setup
I would recommend the course to others
|09:00-09:10||Greeting||Prof. Park (KSDT)|
|09:10-09:20||Introduction ALD Academy||Parsons, Kessels|
|09:10-10:00||Lecture preview||Parsons, Kessels|
|10:00-10:50||ALD basics I
|11:10-12:00||ALD basics II
|13:30-14:20||Advanced ALD processes I
|14:20-15:10||Advanced ALD processes II
|15:30-16:20||Atomic scale processing I
Atomic layer etching
|16:20-17:10||Atomic scale processing II
|17:10-17:30||Wrap up & closing||Parsons, Kessels|
For additional information, please contact:
Prof. Hyeongtag Jeon
Division of Materials Science and Engineering
Email address: firstname.lastname@example.org