This course will be given on 12 November 2018 at Hanyang University in Seoul, Korea. The speakers will be prof. Gregory Parsons and prof. Erwin Kessels.
The course will cover ALD basics (especially the underlying surface chemistry) as well as advanced ALD processes (including plasma-enhanced ALD and spatial ALD). The ALD processes addressed will mainly be related to applications relevant for the semiconductor and display industry.
Furthermore, recent developments in the field of atomic scale processing will be discussed. This includes area-selective deposition (ASD) and atomic layer etching (ALE).
|09:00-09:10||Introduction ALD Academy|
|10:00-10:50||ALD basics I|
|11:10-12:00||ALD basics II|
|13:30-14:20||Advanced ALD processes I|
|14:20-15:10||Advanced ALD processes II|
|15:30-16:20||Atomic scale processing I|
|16:20-17:10||Atomic scale processing II|
|17:10-17:30||Wrap up & closing|
For additional information, please contact:
Prof. Hyeongtag Jeon
Division of Materials Science and Engineering
Email address: email@example.com