This ALD Academy takes place on April 3 at Eindhoven University of Technology, the day before the 4th Area Selective Deposition workshop (ASD2019) in Leuven, Belgium. For those interested, there will be transportation to Leuven for ASD2019 (see below). Note that additional registration is required for ASD2019 (see www.asd2019-workshop.org).
Area-selective deposition (ASD) has recently developed into an active field of research in both academia and industry, triggered by the fact that alignment is becoming a bottleneck in semiconductor fabrication. Especially area-selective atomic layer deposition (ALD) is acquiring attention for implementation in self-aligned fabrication schemes. This development builds on earlier successes in the fields of selective epitaxy and area-selective chemical vapor deposition (CVD). Besides nanoelectronics, ASD is expected to enable bottom-up fabrication in catalysis, energy generation and storage.
Description – This course is an introduction to area-selective deposition (ASD), and addresses fundamental aspects related to initial growth, nucleation mechanisms and selectivity. The current interest in ASD will be put in perspective by providing an introduction to nanopatterning and an overview of the applications of ASD. There will be a focus on area-selective atomic layer deposition (ALD), but also results from the field of selective epitaxy and area-selective CVD will be discussed. Furthermore, an overview of the approaches for area-selective ALD will be presented. The course will have an interactive atmosphere with plenty of time for questions and discussions. During this course, the attendees will acquire understanding of the basics of ASD and learn why ASD has become a hot topic in semiconductor fabrication in recent years.
This ALD Academy takes place on April 3 at Eindhoven University of Technology, the day before the 4th Area Selective Deposition workshop (ASD2019) in Leuven, Belgium.
Target audience – This ALD Academy is aimed at students, researchers, and engineers that are interested or work in the field of ASD, or work on related technologies such as patterning, deposition or etching. It can serve as an introduction for the ASD2019 workshop, which is targeted to a more experienced audience.
Program – The program comprises 6 lectures and runs from 9:00 to 17:00. The speakers are Gregory Parsons, Adrie Mackus and Erwin Kessels.
Welcome and introduction to the ALD Academy
- Introduction to area-selective deposition
- Applications of area-selective deposition
- Nucleation mechanisms
- Approaches to area-selective atomic layer deposition
- Models for nucleation and ASD
Wrap up and closing
Drinks & snacks
The bus to Leuven for ASD2019 will leave around 17:30 and the expected arrival is around 19:00. Please note that there is a small fee of 25 Euro for this transportation and you can indicate your interest below in the registration form.
Registration is open until March 27 and is on a first come, first served basis. Registration includes participation in the course, a digital copy of the course notes, coffee/tea and lunch.
The registration fee depends on whether participants are from academia or industry:
- For participants from academia, the registration fee is €175 per person. For students (including PhD students), the registration fee is €75 per student.
- For participants from industry, the registration is €350 for the 1st person from a company, €175 for each additional person.
- Transport to Leuven costs €25 per person.
Registration is a two-step process:
- Fill in the online form below.
- Transfer the registration fee (free of possible bank charges) to the following bank account while providing the information:
– name(s) of the participant(s)
– organization/companyBank account information:
Account owner: Stichting tot Bevordering van de Plasmachemie
City: Tilburg, The Netherlands
Registration is only complete when both steps have been taken. At that stage, the successful registration will be confirmed.
Registration is now closed