Adrie Mackus (1985) is an assistant professor in Applied Physics at Eindhoven University of Technology, TU/e. He earned his M.Sc. and Ph.D. degrees (both cum laude) in Applied Physics from TU/e in 2009 and 2013, respectively. His PhD thesis “Atomic layer deposition of platinum: from surface reactions to nanopatterning” focused on the reaction mechanisms and nucleation behavior of Pt atomic layer deposition (ALD). Furthermore, novel approaches for nanopatterning based on area-selective ALD were developed. Adrie worked as a postdoc at the department of Chemical Engineering at Stanford University in 2014-2016, for which he received a personal NWO Rubicon grant in 2014. At Stanford he studied the reaction mechanisms of ALD of ternary materials using in situ techniques, aimed at the synthesis of electrocatalysts. At the end of his postdoc, he wrote the review paper “Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review”. Adrie returned to TU/e in 2016 for a tenure track position as an assistant professor in Applied Physics. His current research encompasses thin film deposition and etching for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication. In an invited perspective article in the Up-and-coming series of Chemistry of Materials entitled “From the bottom-up: toward area-selective atomic layer deposition with high selectivity”, Adrie shared his vision on how to advance area-selective ALD technology. Adrie is a founding member of the Early Career Investigator (ECI) network within COST action HERALD and active in the organization of workshops on Area Selective Deposition (ASD). He chaired the 2nd Area Selective Deposition workshop (ASD2017), which took place in Eindhoven in 2017.