Erwin Kessels is a full professor at the Department of Applied Physics of the Eindhoven University of Technology TU/e (The Netherlands). He is also the scientific director of the NanoLab@TU/e facilities which provides full-service and open-access clean room infrastructure for R&D in nanotechnology. Erwin received his M.Sc. and Ph.D. degree (with highest honors) in Applied Physics from the TU/e in 1996 and 2000, respectively. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany). In 2007 the American Vacuum Society awarded him the Peter Mark Memorial Award for “pioneering work in the application and development of in situ plasma and surface diagnostics to achieve a molecular understanding of thin film growth”. In recognition of his research, he received a NWO Vici grant in 2010 to set up a large research program on “nanomanufacturing” in order to bridge the gap between nanoscience/nanotechnology and industrial application. His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) chemical vapor deposition (CVD) and atomic layer deposition (ALD) for a wide variety of applications, mostly within the nanoelectronics and photovoltaics domain. Within the field of ALD, he has contributed to the field most prominently by his work on plasma-assisted ALD and his research related to ALD for photovoltaics. He and his team have also been pioneering in the field of area-selective ALD and in spectroscopic techniques for studying ALD surface reactions. Erwin has served on many conference committees in the field of ALD and he chaired the International Conference on Atomic Layer Deposition in 2008. He has published over 250 papers with over 150 papers in the field of ALD. The latter includes several book chapters and review papers.